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Removal of ultrafine particles below 45nm required for semiconductors and liquid crystals.
Concentrated control of output due to built-in CPU High-frequency ultrasonic cleaner capable of feedback on operating status
Precision cleaning of solar cells, FPD substrates, and HD substrates.
- A new generation cleaning machine compatible with 430 kHz and 950 kHz. - Inherits the high functionality of QUAVA, optimal for single-sheet cleaning. - Cleaning solution with ultrasound is sprayed from a tube-shaped nozzle. - Uniform cleaning is possible with a highly flexible tube-shaped nozzle. - Compatible with side and back irradiation. ● The tube can be selected from three types: front irradiation method, shower irradiation method, and side irradiation method. ● Due to the tube-type nozzle, it is easy to install equipment without limiting the space for the transducer.
